NexION 5000 Multi-Quadrupole ICP Mass Spectrometer | PerkinElmer
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NexION 5000 Multi-Quadrupole ICP Mass Spectrometer

R&D 100 Award winner NexION 5000 ICP-MS

The first in its category to boast four quads, the NexION® 5000 multi-quadrupole ICP-MS is innovatively designed to meet and exceed the demanding requirements of ultra-trace elemental applications. It delivers exceptionally low background equivalent concentrations and outstanding detection limits, key to ensuring accurate, repeatable results. Plus, it provides superior interference removal, phenomenal stability and unmatched matrix tolerance, for results you can count on. Discover how the NexION 5000 takes ICP-MS performance beyond traditional triple quad.

In addition to boasting four quads, the NexION 5000 is also the proud recipient of three awards: Wiley Analytical Science Award, The Analytical Scientist Innovation Award, and R&D 100 Award.

Part Number
Model Name
Technology Type
N8160010
NexION 5000 Cleanroom ICP-MS
Multi-Quad ICP-MS for Cleanroom Applications
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N8160009
NexION 5000 Non-Cleanroom ICP-MS
Multi-Quad ICP-MS for Non-Cleanroom Applications
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Overview

The NexION 5000 Cleanroom ICP-MS is suitable for cleanroom applications, designed specifically for those requiring the highest level of cleanliness and the lowest background equivalent concentrations (<1 ppt, even in hot plasma). It is equipped with a host of new and proprietary technologies which together surpass traditional triple-quad capabilities and redefine your expectations:

  • Four quadrupoles:
    • First: Quadrupole Ion Deflector (Q0) directs ions to the entrance of the first mass filter
    • Second: Transmission Analyzer Quadrupole 1 (Q1, full-sized for <0.7 amu mass resolution), acts as a mass filter or as an ion guide to direct ions to the Quadrupole Universal Cell
    • Third: Quadrupole Universal Cell (Q2), empowered by dynamic bandpass tuning, prevents side reactions with residual reaction gases in the cell
    • Fourth: Transmission Analyzer Quadrupole 2 (Q3, full-sized for <0.7 amu mass resolution), acts as a mass filter or as an ion guide to direct ions to the detector
  • Extended Dynamic Range (EDR) increases linear dynamic range to 1012, allowing to run both high- and low-concentration analytes in a single analytical run, resulting in fewer re-runs
  • Low maintenance for greater uptime:
    • Triple Cone Interface with patent-pending OmniRing combined with Quadrupole Ion Deflector deliver no maintenance beyond cones, for continual operation and improved stability
    • 34 MHz free-running RF generator offers trouble-free user experience - the plasma is generated by the unique LumiCoil RF load coil, which is passively cooled by the extraction (does not require water or gas cooling), so maintenance-free, eliminating need to replace plasma load coils
  • External status lighting provides easy visibility of state of analysis, optimizing efficiencies
  • Syngistix for ICP-MS software (v. 3.0 or higher) brings together the power of the triple-quad ion optics with automated and user-friendly workflows and a contemporary user interface
  • Certified to be able to be upgraded to meet SEMI S2/S8 (emergency button) delivers ease of integration in cleanroom facilities

Specifications

Depth 85.0 cm
Height 85.0 cm
Model Name NexION 5000 Cleanroom ICP-MS
Product Brand Name NexION
Technology Type Multi-Quad ICP-MS for Cleanroom Applications
Weight 191.0 kg
Width 114.0 cm
Resources, Events & More
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Application Brief

Automated Analysis of Semiconductor-Grade BOE with prepFAST S and NexION 5000 ICP-MS

Buffered oxide etchants (BOEs) are blends of hydrofluoric acid, ammonium fluoride, surfactants, and ultrapure water utilized in the semiconductor industry to etch thin films of silicon wafers. The reduction of potential contamination of silicon wafers during the etching process is crucial, as trace ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade Hydrofluoric Acid with prepFAST S and NexION 5000 ICP-MS

Hydrofluoric acid (HF) is widely utilized in the semiconductor industry during the cleaning process of silicon wafers in order to reduce contamination by trace metals, particulates, and organic contaminants which would otherwise alter the functionality of the semiconductors. As such, the use of high ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade Nitric Acid with prepFAST S and NexION 5000 ICP-MS

Nitric acid (HNO3) is widely utilized in the semiconductor industry during the cleaning process of silicon wafers to reduce contamination by trace metals, particulates, and organic contaminants which would otherwise alter the functionality of the semiconductors. As such, the use of a high-quality ac ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade Sulfuric Acid with prepFAST S and NexION 5000 ICP-MS

Sulfuric acid (H2SO4) is used in the semiconductor industry to clean, etch impurities on silicon wafers and strip photoresist during the chip production processes. The reduction of potential contamination on silicon wafers is crucial, as trace-metal, particulate, and organic contaminants can alter t ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade TMAH with prepFAST S and NexION 5000 ICP-MS

Tetramethylammonium hydroxide (TMAH) is a basic solvent widely utilized in the semiconductor industry for photoresist development and lithography applications. The reduction of potential contamination on silicon wafers during the manufacturing processes is crucial as trace-metal, particulate and org ...

PDF 1 MB
Rapid Ultra-Trace Analysis of Impurities in Ultrapure Water using the NexION 5000 ICP-MS

Since ultrapure water (UPW) is used throughout the semiconductor industry in a variety of applications, impurities need to be controlled as these will directly impact the quality and overall yield of semiconductor products. ICP-MS is often used to accurately quantify sub-ppt concentrations of impuri ...

PDF 1 MB
Ultra-Trace Determination of Non-Metallic Elements in Dilute Nitric Acid Using NexION 5000 ICP-MS

Nitric acid is widely used throughout the semiconductor and electronics industry. Various purity grades are required depending on the application and the intended use. For this reason, the semiconductor industry has required ever-lower detection of a broad range of impurities, including non-metallic ...

PDF 1 MB
Ultra-Trace Quantification of Non-Metals in Sulfuric Acid Solutions using the NexION 5000 ICP-MS under Different Cell Gas Conditions

As semiconductor manufacturing processes are being performed at increasing micro-levels, the demand for ICP-MS instrumentation capable of analyzing non-metallic elements at ultra-trace concentrations has grown. For these applications, the use of an ICP-MS system with a full-length resolving quadrupo ...

PDF 1 MB

Application Note

Analysis of High-Purity Silicon Matrices for Trace Contaminants with the NexION 5000 ICP-MS

The late 20th century to early 21st century has been described as the Silicon Age, because of the large impact that elemental silicon (Si) has had on the world economy. Highly purified Si used in semiconductor electronics is essential in the production of transistors and integrated circuit chips use ...

PDF 1 MB
Analysis of Metallic Impurities in Organic Solvents Used in IC Fabrication with the NexION 5000 ICP-MS

The most commonly used organic chemicals in integrated circuit (IC) fabrication are isopropyl alcohol (IPA), propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl ether (PGME), and n-methyl pyrrolidone (NMP). These solvents can leave behind organic film residues with metallic and no ...

PDF 1 MB
Analysis of Metallic Impurities in Si Wafers Using Fully Automated VPD-ICP-MS

Silicon (Si) is the most used semiconductor and is a critical element for producing circuits found in everyday electronics. As more industries utilize semiconductor devices and Si wafers in electronic products and services, there is an increasing demand for Si wafers with minimal impurities due to t ...

PDF 1 MB
Analysis of Metallic Nanoparticles in Semiconductor Process Chemicals Using the NexION 5000 SP-ICP-MS

Metallic contamination in semiconductor products adversely affects device performance and impacts the yield of the fabrication process. To meet the demand for higher yields and performance in wafer substrates, contamination must be minimized on the wafer surface as well as in the substrate itself. T ...

PDF 1 MB
Analysis of Metallic Nanoparticles in Semiconductor-Grade Sulfuric Acid Using the NexION 5000 SP-ICP-MS

Fine and specialized chemicals are used throughout the manufacturing process of semiconductor and electronic products, requiring strict control of impurities. Among these impurities, contaminants of inorganic nature can adversely affect device performance and impact the yield of the fabrication proc ...

PDF 2 MB
Analysis of Phosphoric Acid Coupling the AutoSampler Dilution Module and Automated Standard Addition System with the NexION 5000 ICP-MS

Inductively coupled plasma mass spectrometry (ICP-MS) is an indispensable analytical tool in the semiconductor industry, since one of the most sensitive techniques for analyzing metallic impurities in chemicals. Most chemicals are analyzed with minimum dilution to determine ultra-trace levels of met ...

PDF 908 KB
Analysis of Semiconductor-Grade Chemicals Using Automated Standard Addition System (ASAS)-ICP-MS

Semiconductor device fabrication utilizes a variety of chemicals, whose metallic impurity levels must remain at ultra-trace levels to ensure end product quality. Inductively coupled plasma mass spectrometry (ICP-MS) is one of the most sensitive techniques for metallic impurities testing and has beco ...

PDF 2 MB
Analysis of Semiconductor-Grade Hydrogen Peroxide Using the NexION 5000 ICP-MS

Contaminants in chemicals used during manufacturing processes have a direct impact on product yield and reliability of semiconductor devices. Within the whole process of integrated circuit manufacturing, wafers are sent for repeated cleaning using hydrogen peroxide (H2O2). Semiconductor Equipment an ...

PDF 1 MB
Characterization of Ultrapure Water Using NexION 5000 ICP-MS

For decades, the semiconductor industry has been designing new devices that are smaller, faster and consume less power than their predecessors. To maintain this trend, the critical features of these devices must also become smaller and have fewer defects. The small diameter of a chip’s features requ ...

PDF 2 MB
Determination of Impurities in Electronic-Grade Hydrochloric Acid with the NexION 5000 ICP-MS

During the production of semiconductor devices, it is crucial to ensure that the silicon wafers are free of contaminants and impurities. The use of high-purity chemicals during the cleaning process is critical to the semiconductor product’s overall quality and performance. Therefore, it is essential ...

PDF 1 MB
Direct Analysis of Metallic Impurities in Hydrochloric Gas Using Gas Exchange Device (GED) ICP-MS

In today’s fast-paced world, semiconductors have become indispensable. Demands for faster and smaller chips with higher integration and lower energy consumption are increasing. Potential sources of metallic contamination in semiconductor manufacturing processes are ubiquitous, thus it is critical to ...

PDF 1 MB
Direct Determination of Trace Elements in Nickel-Based Superalloys with the NexION 5000 ICP-MS

Nickel-based superalloys are widely used in challenging environments because of their physical properties, which include, but are not limited to, toughness, high heat resistance, high strength-to-weight ratio, and low thermal conductivity. The required properties of state-of-the-art nickel-based sup ...

PDF 894 KB
Ultra-Trace Elemental Analysis in High-Purity Sulfuric Acid

The production of electronic devices is a complex process that requires the use of ultra-pure chemicals during the manufacturing steps. High-purity-grade sulfuric acid (H2SO4) is generally used for cleaning components and etching all metal and organic impurities on silicon wafers. Impurities in sulf ...

PDF 1 MB

Article

Multi-Quadrupole ICP-MS – Pushing Limits of Detection to the Next Decimal

As the limits of detection (LODs) for trace metal analysis are increasingly being pushed to the next decimal, a need exists to meet these new detection requirements without compromising accuracy or precision. Inductively coupled plasma mass spectrometry (ICP-MS) is often the technique of choice for ...

PDF 1 MB
Sigma Analytical Services’ Journey as a Cannabis, Food, and Pharma Startup Laboratory

Newly regulated industries, such as cannabis, must deal with establishing standardized protocols with the prospect of regulations changing quickly and evolving as the industry expands. When establishing Sigma Analytical Services Inc. in 2017, a new company in a newly regulated industry with the inte ...

PDF 998 KB

Brochure

Analytical Sustainability Solutions

As the fundamental need to safeguard our environment continues to grow, and economic demand increases to support our growing population, it’s important to explore more sustainable avenues to ensure the long-term health of our planet at the same time as encouraging business and economic growth. Perki ...

PDF 2 MB
Automotive Materials Analysis Brochure

This brochure guides you through all our PerkinElmer analytical solutions for the automotive industry. From advanced polymers and rubber materials, to batteries, semiconductors, glass, fuels and lubricants. See how we can offer you fully-rounded laboratory solutions along the whole automotive value ...

PDF 2 MB
Comprehensive and Compliant Solutions for Glass Analysis

It’s clear, glass has a variety of uses, from practical to technological to decorative. In particular, float glass is widely used in architecture, automotive, transportation, photovoltaic, and solar industries. For glass testing labs around the world, we offer highly accurate and tailored solutions ...

PDF 2 MB
NexION 5000 Multi-Quadrupole ICP-MS - Interactive Brochure

In the fast-paced analytical world, accurate and reproducible results are essential to guaranteeing quality and ensuring safety. What many industries have in common is the need for trace-element analysis with superior interference removal, extremely low detection limits, and outstanding background e ...

PDF 2 MB

Case Study

NutriControl and PerkinElmer Collaborate to Serve-up Agricultural and Nutritional Analyses

The science and art of creating and maintaining thriving agricultural ecosystems requires cultivating healthy soil, crops and livestock. The safety and efficacy of agricultural chemicals and their uptake into our food supply requires robust, reliable and effective analytical testing on agrochemicals ...

PDF 393 KB

Ebook

New Developments in Multi-Quadrupole ICP-MS Technology for Challenging Applications

Laboratories conducting trace-elemental analyses require high-performance instrumentation capable of delivering accurate and reproducible results, even at low concentrations. Find out how recent developments in multi-quadrupole ICP-MS technology address these evolving needs. Advantages: superior int ...

PDF 3 MB
NexION 5000 Multi-Quadrupole ICP-MS - Digest of Application Spotlights

Welcome to the application digest for PerkinElmer’s NexION® 5000 Multi-Quadrupole ICP-MS. The multi-award-winning NexION 5000 is the industry’s first and only four-quadrupole ICP-MS system, engineered to remove the most complex interferences and address the most challenging applications requiring ul ...

PDF 8 MB
Palm Oil Analysis. Complete lab solutions from upstream to downstream

Quality control-monitoring and testing are important in ensuring the quality of palm oil. The quality control parameters are used to judge the quality of palm oil products and it can be monitored and tested to ensure that the palm oil is not deliberately or accidentally adulterated.

PDF 11 MB

Flyer

NexION 5000 ICP-MS – Innovation Recognized

Perfect for your most challenging applications, the cutting-edge, multi-award-winning NexION® 5000 Multi-Quadrupole ICP-MS is the industry’s first and only four-quadrupole ICP-MS instrument – taking performance well beyond everyday triple-quad technology. And the scientific community is taking notic ...

PDF 204 KB
Power Up Your Battery Component Analysis Flyer

Download this useful flyer for a summary of how our instrumentation can test for safety, performance and composition of your advanced battery materials. Get an overview of solutions and their benefits in materials characterization techniques from FT-IR, ICP-OES, ICP-MS, DSC, TGA, GC-MS and hyphenate ...

PDF 523 KB
Supporting Sustainability with the NexION ICP-MS Series

Today’s sustainable solutions are opening exciting new ways for businesses to fuel economic growth, while minimizing adverse impact on people and the planet. Laboratories are also working sustainability into their business plans to reduce downtime, waste, and costs – and in many cases, improve their ...

PDF 587 KB

Guide

Atomic Spectroscopy - A Guide to Selecting the Appropriate Technique and System

Atomic spectroscopy is a family of techniques for determining the elemental composition of an analyte by its electromagnetic or mass spectrum. Several analytical techniques are available: Atomic absorption (AA): flame and graphite furnace Inductively coupled plasma optical emission spectroscopy (ICP ...

PDF 1 MB
NexION 5000 ICP-MS Preparing Your Lab

This document provides information to assist in preparing your laboratory for the PerkinElmer NexION® 5000 ICP-MS system prior to instrument delivery and installation.

PDF 1 MB
NexION ICP-MS Series - Superior Interference Removal, Accurate Results

Accurate, reproducible trace elemental analysis is essential to ensuring the quality and safety of our products and our environment, and the award-winning NexION® ICP-MS platform delivers that level of accuracy and repeatability through a host of unique features that provide superior interference re ...

PDF 2 MB
NexION ICP-MS Series Consumables & Supplies Guide

Whether looking for sample introduction components or standards, we have the consumables you need to keep your NexION up and running smoothly and efficiently.

PDF 2 MB

Infographic

Poster

Advanced Solutions for Solar Cells Poster

Download this poster for an all-in-one view of how PerkinElmer instrumentation can answer the analytical needs of the solar market. From R&D of nanomaterials and advanced materials to solar cell component testing including aging and defect analysis - our UV/Vis, DSC, TGA, FT-IR and ICP systems help ...

PDF 1 MB
Infographic - Solutions for your Toxicology Lab

Infographic Poster showing the range of different analytical solutions for Toxicology Labs; from GC and LC, to ICP-MS and UV-Vis. Benchtop and floor standing chromatography, spectroscopy and thermal solutions for everyday robust and reliable analyses. FOR RESEARCH USE ONLY. NOT FOR USE IN DIAGNOSTIC ...

PDF 460 KB

Product Note

NexION 5000 Multi-Quadrupole ICP-MS

The NexION® 5000 is a multi-quadrupole-based ICP-MS instrument engineered to remove the most complex interferences, ideal for multi-element analysis applications requiring ultra-trace-level detection. Download this product note to discover all of its innovative features.

PDF 760 KB

Regulatory Compliance Certification

Product Certificate - Nexion 5000

Product Certificate for the Nexion 5000

PDF 137 KB

Technical Note

Advantages of a Novel Plasma Generator for the NexION 1000/2200/5000 ICP-MS Systems

Unlike other ICP-MS systems on the market that utilize conventional 40-MHz or 27-MHz commercially available generators which are typically customized and modified to work with ICP-MS instruments, the NexION® 1000/2200/5000 ICP-MS systems feature a 34-MHz frequency free-running RF generator, which wa ...

PDF 1 MB
All Matrix Solution System for NexION ICP-MS Platforms

PerkinElmer’s All Matrix Solution (AMS) system provides a number of benefits to simplify analysis of high-matrix samples with the NexION family of ICP-MS instruments. It allows online gas dilution, improving efficiency and preventing contamination, delivering up to 200x dilution and the ability to s ...

PDF 1 MB
Interferences in ICP-MS: Do we still have to worry about them?

Interferences will always occur in ICP-MS and need to be dealt with. However, the NexION® 5000 multi-quadrupole ICP-MS with quadrupole Universal Cell is able to effectively and reproducibly remove spectral interferences leading to improved accuracy, repeatability and reproducibility, while solving p ...

PDF 1 MB
Novel Interface for NexION 2200/5000 ICP-MS Systems – Innovative Design, Uncompromised Performance

The innovative design of the second-generation Triple Cone Interface with patent-pending OmniRing™ was developed for the NexION® 2200 and 5000 ICP-MS systems with both sensitivity and stability in mind. It builds on the Triple Cone Interface geometry of the NexION series and provides unique solution ...

PDF 706 KB
Novel Interference Removal Opportunities with the NexION 5000 ICP-MS

The NexION® 5000 ICP-MS, with multi-quadrupole technology and Universal Cell, is able to take full advantage of element reactivity with 100% pure gases by analyzing them as cluster ions at higher masses where no interferences reside, and the background is clean. The Universal Cell, thanks to its qua ...

PDF 2 MB
TotalQuant Analysis in NexION ICP Mass Spectrometers

TotalQuant, a software feature unique to PerkinElmer's NexION® ICP-MS systems, intelligently interprets the complete mass spectrum, providing semi-quantitative to quantitative results for all elements. TotalQuant and survey scan can provide supplementary and confirmatory information about unknown sa ...

PDF 1 MB

Training

Webinars